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Metal Corrosion of Al-Si-Cu Pattern Wafer Due to Chloride Ion Contaminants
Airborne molecular contaminants (AMCs) Chloride contamination Cleanroom micro-contamination HCl Pattern wafer Semiconductor device
2016/3/28
Chloride ions (Cl–) induce metal corrosion of integrated circuits and cause wafer scrap events in the clean room
environment. In this study, Al-Si-Cu pattern wafers were designed to monitor critical ...