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2017传感器、材料与制造国际会议(2017 International Conference on Sensors, Materials and Manufacturing)
2017 传感器 材料 制造 国际会议
2017/5/22
2017 International Conference on Sensors, Materials and Manufacturing (ICSMM 2017) will be held in Nanhua University, Chiayi, Taiwan during November 24-26, 2017. We strongly believe that ICSMM 2017 wi...
2017年第二十八届SEMI先进半导体制造会议(2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference)(ASMC)
2017年 第二十八届 SEMI先进半导体制造 会议
2017/3/30
ASMC is the leading international technical conference for exploring solutions to improve the collective micro-electronics manufacturing expertise. The conference, with technical sponsorship from IEEE...
Impact of Manufacturing Flow on Yield Losses in Nanoscale Fabrics
Yield Analysis Nanotechnology NASIC Nanowire
2014/12/8
Reliable and scalable manufacturing of nanofabrics entails significant challenges. Scalable nano-manufacturing approaches that employ the use of lithographic masks in conjunction with nanofabrication ...
Critical Area Driven Dummy Fill Insertion to Improve Manufacturing Yield
Dummy fill Manufacturability Critical Area CMP
2014/12/8
Non-planar surface may cause incorrect transfer of patterns during lithography. In today’s IC manufacturing, chemical mechanical polishing (CMP) is used for topographical planarization. Since polish r...
Using Nanotubes in Computer Chips--A new technique for growing carbon nanotubes should be easier to integrate with existing semiconductor manufacturing processes
nanotubes computer chips existing semiconductor
2009/9/15
Researchers in the lab of MIT materials science professor Carl V. Thompson grew dense forests of crystalline carbon nanotubes on a metal surface at temperatures close to those characteristic of compu...